ion beam sputtering
基本解释
- 离子束溅射;离子束溅镀法
英汉例句
- WO_3 thin films prepared by Reactive Ion Beam Sputtering are amorphous at RT substrate temperature.
本文利用反应离子束溅射技术制备WO_3薄膜,在衬底温度为室温时,溅射制备的薄膜经电子束(?) - Ion beam sputtering deposited Ni was used as etching mask. The measured etching rates increased with the increasing ICP dc bias.
采用离子束溅射生长的N i作为刻蚀掩模,刻蚀速率随ICP直流偏压的增加而增加。 - The results about the research on the characters of ion beam sputtering show that grid voltage and sputtering gas pressure have great influences on ion beam distribution and current.
溅射特性研究结果表明:屏极电压和溅射气压对离子束均匀性和束流密度影响显著;
双语例句
词组短语
- ion n beam sputtering 离子束溅射
- reactive ion -beam sputtering 反应离子束溅射
- ion -beam sputtering technique 离子束溅射技术
- ion beam sputtering system 离子束溅镀系统;离子束微影术
- ion beam sputtering method 离子束溅射法
短语
专业释义
- 离子束沉积
- 离子束溅射
- 离子束溅射